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In addition to the full line of J.T.BakerŪ photoresist strippers and residue removers, Mallinckrodt Baker offers a line of photoresist ancillaries. J.T.Baker photoresist ancillaries support every step of your process including priming, edge bead removal, development and rinse — you can depend on the J.T.Baker brand for all your chemical needs. All J.T.Baker photoresist ancillaries are available in reusable containers.
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BakerClean pCMP Cleaner for Copper
The new Baker pCMP-800 and pCMP-850 cleaners effectively remove slurry particles and trace metals from substrates after CMP processing. Both products are compatible with copper and low-k dielectrics, as well as aluminum, tungsten and silicon dioxide. The pCMP-800 cleaner is designed for rapid, efficient cleaning in the shorter exposure time of most spray and brush systems. The pCMP-850 cleaner is ideal for gentler cleaning of fragile substrates in spray, brush or longer-exposure bath processes.
For more information contact our Application Engineering group at 1-800-JTBAKER (800-582-2537), extension 9346, outside the US 1-908-859-9346, or micro.mbi@Covidien.com.
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